Usage Charges for ARIM/NOF Users

NIMS Nanofabrication Unit Price Table (Large Enterprises) *1

※Applicable as of July 1st, 2026  (Tax Excluded)

  ARIM (Data Provision) *2 ARIM (No Data Provision) NOF (Undisclosed Use)
Instrument List  Self-Use   

Operation Training

Technical Service   Self-Use    Operation Training Technical Service   Self-Use    Operation Training Technical Service  
EB Lithography [JBX-8100FS] ¥30,500 Self-use

¥8,000

Self-use

¥24,000

¥58,000 Self-use

¥16,000
Self-use

¥48,000
¥75,400 Self-use

¥20,800
Self-use

¥41,600
EB Lithography [ELS-BODEN100] ¥19,500 ¥36,000 ¥46,800
Laser Lithography [DWL66+]
Maskless Lithography [DL-1000/NC2P]
Maskless Lithography [MLA150]
Maskless Lithography [DL-1500iS2]
ALD [TFS200]
ICP-RIE [RV-APS-SE]
ICP-RIE [Spica #1]
ICP-RIE [Spica #2]
Ion Beam Milling [16IBE]
FE-SEM+EDX [S-4800]
FE-SEM+EDX [SU8000]
FE-SEM+EDX [SU8230]
¥14,000 ¥25,000 ¥32,500
Other Instruments *3 ¥8,500 ¥14,000 ¥18,200

NIMS Nanofabrication Unit Price Table (Small to Medium Enterprises) *1

※Applicable as of July 1st, 2026  (Tax Excluded)

  ARIM (Data Provision) *2 ARIM (No Data Provision) NOF (Undisclosed Use)
Instrument List  Self-Use    

Operation Training  

Technical Service  Self-Use     Operation Training   Technical Service  Self-Use     Operation Training   Technical Service
EB Lithography [JBX-8100FS] ¥25,000 Self-use

¥6,400
Self-use

¥19,200
¥30,500 Self-use

¥8,000
Self-use

¥24,000
¥39,650 Self-use

¥10,400
Self-use

¥31,200
EB Lithography [ELS-BODEN100] ¥16,200 ¥19,500 ¥25,350
Laser Lithography [DWL66+]
Maskless Lithography [DL-1000/NC2P]
Maskless Lithography [MLA150]
Maskless Lithography [DL-1500iS2]
ALD [TFS200]

ICP-RIE [RV-APS-SE]
ICP-RIE [Spica #1]
ICP-RIE [Spica #2]
Ion Beam Milling [16IBE]

FE-SEM+EDX [S-4800]
FE-SEM+EDX [SU8000]
FE-SEM+EDX [SU8230]
¥11,800 ¥14,000 ¥18,200
Other Instruments *3 ¥7,400 ¥8,500 ¥11,050

NIMS Nanofabrication Unit Price Table (Start-ups・Academia) *1

※Applicable as of July 1st, 2026  (Tax Excluded)

  ARIM (Data Provision) *2 ARIM (No Data Provision) NOF (Undisclosed Use)
Instrument List  Self-Use     Operation Training Technical Service  Self-Use     Operation Training Technical Service  Self-Use     Operation Training  Technical Service
EB Lithography [JBX-8100FS] ¥14,000 Self-use

¥3,200
Self-use

¥9,600
¥19,500 Self-use

¥4,800
Self-use

¥14,400
¥25,350 Self-use

¥6,240
Self-use

¥18,720
EB Lithography [ELS-BODEN100] ¥9,600 ¥12,900 ¥16,770
Laser Lithography [DWL66+]
Maskless Lithography [DL-1000/NC2P]
Maskless Lithography [MLA150]
Maskless Lithography [DL-1500iS2]
ALD [TFS200]
ICP-RIE [RV-APS-SE]
ICP-RIE [Spica #1]
ICP-RIE [Spica #2]
Ion Beam Milling [16IBE]
FE-SEM+EDX [S-4800]
FE-SEM+EDX [SU8000]
FE-SEM+EDX [SU8230]
¥7,400 ¥9,600 ¥12,480
Other Instruments *3 ¥5,200 ¥6,300 ¥8,190

*1 Capital stock over 100 million yen = large enterprise, less than 100 million yen = small to medium-sized enterprise.
       If you're Start-up, please contact us. 
*2 Applicable only when “data provision” is selected and the data is registered on RDE system.
*3 ARIM (Data Provision) is not available for some equipment.

Remarks

  1. The table above shows the unit price per hour (tax excluded) and it will be multiplied by the usage hours*.
  2. 15-minute reservation is the minimum unit and the usage less than that time shall be reserved for 15 minutes.
  3. Self-Use: Instruments will be operated on your own upon issue of operation license.
  4. Operation Training: Training will be given for acquisition of operation license.
  5. Technical Service: For those who have difficulty visiting NIMS, part of fabrication process will be carried out by staff.
  6. Instrument usage charges are included in the unit prices for operation training/technical service.
  7. If lockers or other facilities are used (occupied) on a continuous basis, charges will apply as part of the cleanroom facility usage fee.
  8. When depositing gold (Au) using a deposition system, an Au material usage fee will be charged according to the film thickness.

* "Usage hours" means the reservation time (=occupation of the instrument: including the time necessary for starting up/shutting down ).

Price Table for External Use

Contact

Please contact NIMS Nanofabrication Unit for inquiries regarding this page.

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  • 【Update】Jun. 01, 2026
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